Electron drift and attachment in CHF3 and its mixtures with argon

被引：19
|
作者：
Wang, YC [1 ]
Christophorou, LG [1 ]
Olthoff, JK [1 ]
Verbrugge, JK [1 ]
机构：
[1] NIST, Div Elect, Elect & Elect Engn Lab, Gaithersburg, MD 20899 USA
来源：
CHEMICAL PHYSICS LETTERS | 1999年 / 304卷 / 5-6期
关键词：
D O I：
10.1016/S0009-2614(99)00338-3
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Measurements are reported of the electron drift velocity, w, in CHF3 gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate constant (similar to 13 X 10(-14) cm(3) s(-1) for density-reduced electric fields, E/N < 50 X 10(-17) V cm(2)) has been measured, which may be due to impurities. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：303 / 308
页数：6
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