Studies of electron trapping in III-nitride semiconductors

被引:0
|
作者
Lopatiuk, Olena [1 ]
Osinsky, Andrei [1 ]
Chernyak, Leonid [1 ]
机构
[1] Univ Cent Florida, Dept Phys, Orlando, FL 32816 USA
来源
关键词
III-Nitrides; p-type GaN; electron trapping; acceptors; diffusion length; cathodoluminescence;
D O I
10.1117/12.658016
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Effects of electron irradiation on GaN and AlxGa(1-x)N doped with acceptor-forming species (Mg, C, Fe, and Mn) were studied by cathodoluminescence and electron beam induced current techniques. Low energy electron beam irradiation was shown to induce a systematic decay of the cathodoluminescence intensity, which is accompanied by increased electronic carrier diffusion length, indicating the increase of carrier lifetime. Temperature-dependent cathodoluminescence measurements allowed to estimate the activation energy for irradiation-induced effects, which was found to be comparable to the ionization energy of the dominant acceptor species. These observations are consistent with trapping of non-equilibrium electrons on deep, non-ionized acceptor levels. In (AI)GaN:Mg and GaN:C electrons are trapped by the ground state of the neutral acceptor atom, while in TM-doped compounds, electron irradiation-induced processes appear to involve a more energetically accessible excited states of the acceptors.
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页数:15
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