The stability of thin diblock copolymer films with respect to the annealing above the microphase separation temperature is investigated on long time scales and at different film thicknesses. Poly(styrene-block-p-methylstyrene) diblock copolymer films on top of silicon substrates are examined with scanning force microscopy and off-specular X-ray scattering. At film thickness below the lamellar spacing of the bulk material a dewetting is observed. The kinetics of the film destabilization are explainable within a spinodal dewetting model. The observed dewetting structures belong to a wet dewetting. In the case of film thicknesses which enable the buildup of a few lamellae no sign of instability was detected.
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Hong Kong Univ Sci & Technol, Inst Nano Sci & Technol, Kowloon, Hong Kong, Peoples R ChinaHong Kong Univ Sci & Technol, Inst Nano Sci & Technol, Kowloon, Hong Kong, Peoples R China
Tsui, OKC
Du, B
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Hong Kong Univ Sci & Technol, Inst Nano Sci & Technol, Kowloon, Hong Kong, Peoples R ChinaHong Kong Univ Sci & Technol, Inst Nano Sci & Technol, Kowloon, Hong Kong, Peoples R China
Du, B
Xie, F
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Hong Kong Univ Sci & Technol, Inst Nano Sci & Technol, Kowloon, Hong Kong, Peoples R ChinaHong Kong Univ Sci & Technol, Inst Nano Sci & Technol, Kowloon, Hong Kong, Peoples R China
Xie, F
Wang, YJ
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Hong Kong Univ Sci & Technol, Inst Nano Sci & Technol, Kowloon, Hong Kong, Peoples R ChinaHong Kong Univ Sci & Technol, Inst Nano Sci & Technol, Kowloon, Hong Kong, Peoples R China
Wang, YJ
Yan, H
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Hong Kong Univ Sci & Technol, Inst Nano Sci & Technol, Kowloon, Hong Kong, Peoples R ChinaHong Kong Univ Sci & Technol, Inst Nano Sci & Technol, Kowloon, Hong Kong, Peoples R China
Yan, H
Yang, Z
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Hong Kong Univ Sci & Technol, Inst Nano Sci & Technol, Kowloon, Hong Kong, Peoples R ChinaHong Kong Univ Sci & Technol, Inst Nano Sci & Technol, Kowloon, Hong Kong, Peoples R China
Yang, Z
NANO SCIENCE AND TECHNOLOGY: NOVEL STRUCTURES AND PHENOMENA,
2003,
: 187
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192