Efficient all-solid-state 213 nm laser source for microlithography

被引：0
|
作者：
Kubota, S [1 ]
Wiechmann, W [1 ]
Liu, LY [1 ]
Oka, M [1 ]
Kikuchi, H [1 ]
Suganuma, H [1 ]
Masuda, H [1 ]
Takeda, M [1 ]
机构：
[1] SONY CORP,RES CTR,KUBOTA OPTOELECT LAB,SHINAGAWA KU,TOKYO 141,JAPAN
来源：
OPTICAL MICROLITHOGRAPHY IX | 1996年 / 2726卷
关键词：
frequency-quintupled Q-sw Nd:YAG laser; repetition rate; microlithography; pump depletion;
D O I：
10.1117/12.240946
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：841 / 846
页数：6
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