Deposition and Characterization of FeB thin films by Electrochemical Method

被引：1

作者：

Park, Hyejin ^{[1
]}

Ahn, Hosang ^{[1
]}

Kim, Seon-Bae ^{[1
]}

Jeong, Jaeyoung ^{[1
]}

Kim, Dong-Joo ^{[1
]}

机构：

[1] Auburn Univ, Mat Res & Educ Ctr, Auburn, AL 36849 USA

来源：

SENSORS, ACTUATORS, AND MICROSYSTEMS (GENERAL) - 221ST ECS MEETING | 2013年 / 45卷 / 14期

关键词：

ELECTRODEPOSITION; WIRELESS; ALLOYS;

D O I：

10.1149/04514.0037ecst

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Magnetostrictive materials exhibit a resonant frequency under an alternating magnetic field. Amorphous iron-boron film is well known as a magnetostrictive material. In order to obtain an amorphous phase of FeB thin film by electrochemical deposition, solution deposition parameters - such as current density, solution concentration, and ratio of precursors - was investigated. The amorphous FeB thin films were deposited at higher current densities and concentration of the solution. The relationship between phase formation and kinetic effect was also studied. Magnetic behavior of these films was examined by measuring the resonant frequency.

引用

页码：37 / 42

页数：6

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