Investigation of the Properties of Al-doped ZnO Thin Films with Sputtering Pressure Deposition by RF Magnetron Sputtering

被引：0

作者：

Shuai, Weiqiang ^{[1
]}

Hu, Yuehui ^{[1
]}

Chen, Yichuan ^{[1
]}

Tong, Fan ^{[1
]}

Lao, Zixuan ^{[1
]}

机构：

[1] Jingdezhen Ceram Inst, Sch Mech & Elect Engn, Jingdezhen 333403, Jiangxi, Peoples R China

来源：

PROCEEDINGS OF THE 7TH INTERNATIONAL CONFERENCE ON EDUCATION, MANAGEMENT, INFORMATION AND MECHANICAL ENGINEERING (EMIM 2017) | 2017年 / 76卷

关键词：

Al-doped ZnO; RF magnetron sputtering; Sputtering pressure;

D O I：

暂无

中图分类号：

TP39 [计算机的应用];

学科分类号：

081203 ; 0835 ;

摘要：

The aluminum doped ZnO thin films were prepared on quartz glass substrates by RF magnetron sputtering at room temperature with varying sputtering pressure. As the sputtering pressure increased, the crystallinity of AZO thin films improved and the surface crystallite size increased. The optimized AZO thin film obtained at the sputtering pressure of 1 Pa exhibited the lowest resistivity of 8.6X10((boolean AND)-3) Omega.cm and an average transmittance of 74.15% in the wavelength range of 400 to 1000 nm.

引用

页码：1789 / 1792

页数：4

共 50 条

[1] Effects of sputtering pressure on properties of Al doped ZnO thin films dynamically deposited by rf magnetron sputtering
Zhou, H. B.
Zhang, H. Y.
Tan, M. L.
Zhang, W. J.
Zhang, W. L.
[J]. MATERIALS RESEARCH INNOVATIONS, 2012, 16 (06) : 390 - 394
[2] Effect of Sputtering Pressure on Al-doped ZnO Films by DC Magnetron Sputtering
Sun Ke-Wei
Zhou Wan-Cheng
Huang Shan-Shan
Tang Xiu-Feng
[J]. JOURNAL OF INORGANIC MATERIALS, 2012, 27 (10) : 1112 - 1116
[3] Investigation of the biaxial stress of Al-doped ZnO thin films on a flexible substrate with RF magnetron sputtering
Huang, Kuo-Ting
Chen, Hsi-Chao
Cheng, Po-Wei
Chang, Jhe-Ming
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2016, 55 (01)
[4] Improved physical properties of Al-doped ZnO thin films deposited by unbalanced RF magnetron sputtering
Sreedhar, Adem
Kwon, Jin Hyuk
Yi, Jonghoon
Gwag, Jin Seog
[J]. CERAMICS INTERNATIONAL, 2016, 42 (13) : 14456 - 14462
[5] Effects of in situ annealing on the properties of Al-doped ZnO thin films deposited by RF magnetron sputtering
Kim, Deok-Kyu
Park, Choon-Bae
[J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2014, 25 (04) : 1589 - 1595
[6] Effects of in situ annealing on the properties of Al-doped ZnO thin films deposited by RF magnetron sputtering
Deok-Kyu Kim
Choon-Bae Park
[J]. Journal of Materials Science: Materials in Electronics, 2014, 25 : 1589 - 1595
[7] Effect of substrate temperature on the properties of Al-doped ZnO films by RF magnetron sputtering
Wu, Yue-Bo
Lei, Sheng
Wang, Zhe
Zhao, Ru-Hai
Huang, Lei
Li, Hui
[J]. OPTOELECTRONIC MATERIALS, PTS 1AND 2, 2010, 663-665 : 1293 - +
[8] Structural and optical properties of Al-doped ZnO films coated by RF magnetron sputtering
Wu, Yue-Bo
Huang, Bo
Zhang, Liang-Tang
Li, Jing
Wu, Sun-Tao
[J]. 3RD INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTICAL TEST AND MEASUREMENT TECHNOLOGY AND EQUIPMENT, PARTS 1-3, 2007, 6723
[9] CONDUCTIVE AND TRANSPARENT AL-DOPED ZNO THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING
CHEN, YI
DUH, JG
[J]. MATERIALS CHEMISTRY AND PHYSICS, 1991, 27 (04) : 427 - 439
[10] Structural and optical properties of Al-doped ZnO thin films produced by magnetron sputtering
Augusto de Queiroz, Jose Cesar
de Azevedo Filho, Joao Batista
de Medeiros Neto, Jose Quinzinho
Nascimento, Igor Oliveira
de Souza, Ivan Alves
de Oliveira Queiroz, Maria Gerlania
de Melo, Emanuel Benedito
Diniz Melo, Jose Daniel
de Carvalho Costa, Thercio Henrique
[J]. PROCESSING AND APPLICATION OF CERAMICS, 2020, 14 (02) : 119 - 127

← 1 2 3 4 5 →