The study and analysis of near-field light intensity

被引:0
|
作者
Wang, KY
Jin, Z
Huang, WH
机构
关键词
D O I
10.1117/12.263073
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper a numerical simulation is used to calculate near-field intensity by ''split light beam.'' The calculation proves to be valid as we apply it to the plane wave. In the case of one dimension structure such as a compact disk sample, the near-field intensity profiles show a rather complicated structure. In many cases the nearfield intensity does not represent the actual surface profile. The near-field intensity is strongly modulated by the surface structure. When the distance between the sample and the probe becomes larger, some subtle perturbation is added to the intensity profile, and a shift between the surface and the intensity prole became more clear. The shift may cause some problems when we use the optical probe as a multi-function probe to do some lithograph work or to position. In this paper,a comparison between the calculation and experiment results was made.
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页码:191 / 197
页数:3
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