Sputter-prepared BiFeO3(001) films on L10 FePt(001)/glass substrates

被引：12

作者：

Chang, H. W. ^{[1
]}

Yuan, F. T. ^{[2
]}

Shih, C. W. ^{[3
]}

Wang, C. R. ^{[1
]}

Chang, W. C. ^{[3
]}

Jen, S. U. ^{[4
]}

机构：

[1] Tunghai Univ, Dept Phys, Taichung 407, Taiwan

[2] Natl Taiwan Univ, Dept Phys, Taipei 106, Taiwan

[3] Natl Chung Cheng Univ, Dept Phys, Chiayi 621, Taiwan

[4] Acad Sinica, Inst Phys, Taipei 115, Taiwan

来源：

JOURNAL OF APPLIED PHYSICS | 2012年 / 111卷 / 07期

关键词：

THIN-FILMS;

D O I：

10.1063/1.3679003

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The preparation of BFO films by sputtering at a temperature as low as 450 degrees C on glass and commercial Pt/Ti/SiO2/Si(001) substrates have been studied. The underlayers with different orientations were prepared on the glass substrates including strongly textured Pt(111) and L1(0)-FePt(001) induced by rapid thermal annealing process. Isotropic perovskite BFO grains with size of about 200 nm formed on the commercial substrates, showing larger surface roughness. Pt(111) suppresses BiFeO3 phase. Single phase perovskite BFO with strong (001) texture, reduced surface roughness and fine grain size was formed on the L1(0)-FePt(001) buffer layer. Considerable enhancement of ferroelectric properties was achieved as compared to the films grown on commercial substrate. (C) 2012 American Institute of Physics. [doi:10.1063/1.3679003]

引用

页数：3

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