Auto-cleaning of deposited tin debris in a laser-produced plasma extreme ultraviolet source by using a liquid jet target containing tin chloride

被引：0

作者：

Kaku, M. ^{[1
]}

Suetake, S. ^{[1
]}

Senba, Y. ^{[1
]}

Katto, M. ^{[2
]}

Kubodera, S. ^{[1
]}

机构：

[1] Miyazaki Univ, Dept Elect & Elect Engn & Photon Sci Ctr, Miyazaki 8892192, Japan

[2] Miyazaki Univ, Cooperat Res Ctr, Miyazaki 8892192, Japan

来源：

APPLIED PHYSICS B-LASERS AND OPTICS | 2008年 / 93卷 / 2-3期

关键词：

52; 50; Dg; 77; -j; Jm;

D O I：

10.1007/s00340-008-3237-6

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We have demonstrated auto-cleaning of deposited tin debris produced in a laser-plasma extreme ultraviolet (EUV) source by using a liquid jet target containing tin chloride solution. The use of double laser pulse irradiation improved the EUV conversion efficiency of 1.1%, which was 3.3 times as large as that obtained with single laser pulse irradiation. At an appropriate concentration of tin chloride, the amount of deposited debris was balanced out with that of sputtered and/or etched debris, resulting in a thickness of deposited debris less than 1 nm after 40,000 laser pulse irradiations.

引用

页码：361 / 364

页数：4

共 43 条

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[43] EUV (extreme ultraviolet) light source by laser produced plasma using tin through-hole targets - EUV emission and ablation process in conical and cylindrical through-holes
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