Characterization of GaN microstructures grown by plasma-assisted molecular beam epitaxy

被引:0
|
作者
Lo, Ikai [1 ,2 ]
Pang, Wen-Yuan [1 ,2 ]
Chen, Wen-Yen [3 ]
Hsu, Yu-Chi [1 ,2 ]
Hsieh, Chia-Ho [1 ,2 ]
Shih, Cheng-Hung [1 ,2 ]
Chou, Mitch M. C. [1 ,2 ]
Hsu, Tzu-Min [3 ]
Hsu, Gary Z. L. [4 ]
机构
[1] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 80424, Taiwan
[2] Natl Sun Yat Sen Univ, Dept Mat & Optoelect Sci, Kaohsiung 80424, Taiwan
[3] Natl Cent Univ, Dept Phys, Tao Yuan 32001, Taiwan
[4] United Crystal Corp, Wenshan, Miaoli, Taiwan
来源
AIP ADVANCES | 2013年 / 3卷 / 06期
关键词
LIGHT-EMITTING-DIODES; SPONTANEOUS POLARIZATION; NITRIDE;
D O I
10.1063/1.4812871
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The characterization of GaN microstructures grown by plasma-assisted molecular beam epitaxy on LiAlO2 substrate was studied by cathodoluminescence and photoluminescence measurements. We demonstrated that the cathodoluminescence from oblique semi-polar surfaces of mushroom-shaped GaN was much brighter than that from top polar surface due to the reduction of polarization field on the oblique semi-polar surfaces. It implies that the oblique semi-polar surface is superior for the light-emitting surface of wurtzite nano-devices. (C) 2013 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License. [http://dx.doi.org/10.1063/1.4812871]
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页数:8
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