Method of porous diamond deposition on porous silicon

被引:6
|
作者
Baranauskas, V [1 ]
Peterlevitz, AC [1 ]
Chang, DC [1 ]
Durrant, SF [1 ]
机构
[1] Univ Estadual Campinas, Fac Engn Eletr & Computac, BR-13083970 Campinas, SP, Brazil
基金
巴西圣保罗研究基金会;
关键词
porous diamond deposition; porous silicon; chemical vapor deposition; porous materials; diamond membranes;
D O I
10.1016/S0169-4332(01)00648-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this paper, we discuss the experimental results of the fabrication of porous diamond/porous silicon and porous diamond structures by chemical vapor deposition of diamond over a skeleton of porous silicon, replicating the porous surface geometry around the Si pores and also creating new porous diamond structures. Scanning electron microscopy (SEM) revealed that the diamond nuclei are deposited on the top of the porous silicon skeleton, forming isolated grains in the first nucleation stages, and then growing like the usual structure of most ceramic materials, making a self-sustained porous diamond structure. Raman spectroscopy revealed that the diamond films are of good quality, close to that of diamond films grown on crystalline silicon. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:108 / 113
页数:6
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