Hydrogen self-trapping near silicon atoms in Ge-rich SiGe alloys

被引:4
|
作者
Pereira, RN [1 ]
Nielsen, BB
Coutinho, J
Torres, VJB
Briddon, PR
机构
[1] Univ Aarhus, Inst Phys & Astron, DK-8000 Aarhus, Denmark
[2] Univ Aveiro, Dept Phys, P-3810193 Aveiro, Portugal
[3] Univ Newcastle Upon Tyne, Sch Nat Sci, Newcastle Upon Tyne NE1 7RU, Tyne & Wear, England
关键词
D O I
10.1063/1.2193802
中图分类号
O59 [应用物理学];
学科分类号
摘要
Infrared absorption spectroscopy and ab initio density functional modeling are used to investigate hydrogen defects that are stable at and above room temperature in proton-implanted Ge-rich SiGe alloys. We find that Si atoms are effective nucleation sites for hydrogen, leading to the formation of a dominant defect closely related to the H-2(*) dimer in pure Si and Ge. The minority Si species in the alloys stabilizes the new complex, and strongly reduces the trapping efficiency of hydrogen by vacancies and self-interstitials. (c) 2006 American Institute of Physics.
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页数:3
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