On negative ions Langmuir probe measurements in an Ar+4%CF4 currentless plasma

被引:0
|
作者
Popov, T [1 ]
Ivanova, D [1 ]
Tchernookov, M [1 ]
机构
[1] Univ Sofia, Fac Phys, Sofia 1164, Bulgaria
关键词
D O I
暂无
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:473 / 474
页数:2
相关论文
共 50 条
  • [1] Langmuir probe measurements in inductively coupled CF4 plasmas
    Huang, S
    Ning, ZY
    Xin, Y
    Di, XL
    SURFACE & COATINGS TECHNOLOGY, 2006, 200 (12-13): : 3963 - 3968
  • [2] NEGATIVE-IONS IN A RADIOFREQUENCY PLASMA IN CF4
    JAUBERTEAU, JL
    MEEUSEN, GJ
    HAVERLAG, M
    KROESEN, GMW
    DEHOOG, FJ
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1991, 24 (03) : 261 - 267
  • [3] On determination the probe potential with respect to the plasma potential by Langmuir probe second derivative measurements in negative ions rich currentless plasma
    Popov, TS
    Ivanova, D
    Dimitrova, M
    Tchernookov, M
    INTERNATIONAL CONFERENCE ON PHENOMENA IN IONIZED GAS, VOL I, PROCEEDINGS, 1999, : 17 - 18
  • [4] Langmuir probe and mass spectrometric measurements in inductively coupled CF4 plasmas
    Rao, MVVS
    Sharma, SP
    Cruden, BA
    Meyyappan, M
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2002, 11 (01): : 69 - 76
  • [5] Fluorocarbon ions in oxide contact etching with CF4/Ar plasma
    Choi, CJ
    Kwon, OS
    Seol, YS
    PLASMA PROCESSING XII, 1998, 98 (04): : 157 - 164
  • [6] Probe measurements and global model of inductively coupled Ar/CF4 discharges
    Kimura, T.
    Ohe, K.
    Plasma Sources Science and Technology, 1999, 8 (04): : 553 - 560
  • [7] Langmuir probe measurements in inductively coupled CF4-Ar Plasmas
    Rao, MVVS
    Meyyappan, M
    Sharma, SP
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2002, 149 (10) : C487 - C491
  • [8] Probe measurements and global model of inductively coupled Ar/CF4 discharges
    Kimura, T
    Ohe, K
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 1999, 8 (04): : 553 - 560
  • [9] CF AND CF2 ACTINOMETRY IN A CF4/AR PLASMA
    KISS, LDB
    NICOLAI, JP
    CONNER, WT
    SAWIN, HH
    JOURNAL OF APPLIED PHYSICS, 1992, 71 (07) : 3186 - 3192
  • [10] Rate Coefficients of Ar+ Ions in Ar/CF4 Mixtures
    Nikitovic, Z.
    Stojanovic, V.
    Raspopovic, Z.
    ACTA PHYSICA POLONICA A, 2018, 134 (06) : 1134 - 1136