Applications of Focused Ion Beam Technology in Bonding Failure Analysis for Microelectronic Devices

被引:2
|
作者
Chen, Yuan [1 ]
Zhang, Xiaowen [1 ]
机构
[1] 110 Dongguanzhuang Rd, Guangzhou, Guangdong, Peoples R China
关键词
Focused Ion Beam; Microelectronic Device; Failure Analysis; Bonding Failure;
D O I
10.4028/www.scientific.net/AMM.58-60.2171
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
Focused ion beam (FIB) system is a powerful microfabrication tool which uses electronic lenses to focus the ion beam even up to nanometer level. The FIB technology has become one of the most necessary failure analysis and failure mechanism study tools for microelectronic device in the past several years. Bonding failure is one of the most common failure mechanisms for microelectronic devices. But because of the invisibility of the bonding interface, it is difficult to analyze this kind of failure. The paper introduced the basic principles of FIB technology. And two cases for microelectronic devices bonding failure were analyzed successfully by FIB technology in this paper.
引用
收藏
页码:2171 / +
页数:2
相关论文
共 50 条
  • [1] Focused ion beam in failure analysis of microelectronic devices
    Liu, L
    Wang, P
    [J]. ADVANCES AND APPLICATIONS IN THE METALLOGRAPHY AND CHARACTERIZATION OF MATERIALS AND MICROELECTRONIC COMPONENTS: PROCEEDINGS OF THE TWENTY-EIGHTH ANNUAL TECHNICAL MEETING OF THE INTERNATIONAL METALLOGRAPHIC SOCIETY, 1996, 23 : 99 - 102
  • [2] Focused ion beam implantation for opto- and microelectronic devices
    Konig, H
    Mais, N
    Hofling, E
    Reithmaier, JP
    Forchel, A
    Mussig, H
    Brugger, H
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (04): : 2562 - 2566
  • [3] Focused Ion Beam Technology and Application in Failure Analysis
    Chen, Yuan
    Zhang, Xiaowen
    [J]. 2010 11TH INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY & HIGH DENSITY PACKAGING (ICEPT-HDP), 2010, : 957 - 960
  • [4] Focused ion beam technology for optoelectronic devices
    Reithmaier, JP
    Bach, L
    Forchel, A
    [J]. APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 2003, 680 : 584 - 587
  • [5] Failure analysis of microelectronic devices for space applications
    Krishnaraju, V
    Venkatesh, K
    Ravindra, M
    Nanjundaswamy, TS
    [J]. PHYSICS OF SEMICONDUCTOR DEVICES, VOLS 1 AND 2, 1998, 3316 : 1018 - 1021
  • [6] FOCUSED ION-BEAM TECHNOLOGY AND APPLICATIONS
    MELNGAILIS, J
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (02): : 469 - 495
  • [7] Focused ion beam technology and ultimate applications
    Gierak, Jacques
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2009, 24 (04)
  • [8] Focused ion beam applications to solid state devices
    Matsui, S
    Ochiai, Y
    [J]. NANOTECHNOLOGY, 1996, 7 (03) : 247 - 258
  • [9] Recent advances in focused ion beam technology and applications
    Nabil Bassim
    Keana Scott
    Lucille A. Giannuzzi
    [J]. MRS Bulletin, 2014, 39 : 317 - 325
  • [10] A review of focused ion beam applications in microsystem technology
    Reyntjens, S
    Puers, R
    [J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2001, 11 (04) : 287 - 300