Photolithographic patterning of a conductive polymer using a polymeric photoacid generator and a traceless removable group

被引：16

作者：

Salavagione, HJ ^{[1
]}

Miras, MC ^{[1
]}

Barbero, C ^{[1
]}

机构：

[1] Univ Nacl Rio Cuarto, Dept Quim, RA-5800 Rio Cuarto, Argentina

来源：

MACROMOLECULAR RAPID COMMUNICATIONS | 2006年 / 27卷 / 01期

关键词：

conducting polymers; lithography; photoacid generator; traceless;

D O I：

10.1002/marc.200500653

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

In the present communication we describe a photolithographic method to produce polyaniline (PANI) patterns using PANI modified with a traceless removable functional group (nitrosated polyaniline, PANI-NO) and external inexpensive polymeric photoacid generators (poly (vinyl chloride), PVC). Therefore, residual sub-products created by irradiation of the plate do not remain occluded in the polymeric films. The borders of the patterns are better defined than in the case of chemical lithography using inorganic acids as the hydrolyzing agent.

引用

页码：26 / 30

页数：5

共 22 条

[21] A new technique for studying photoacid generator chemistry and physics in polymer films using on-wafer ellipsometry and acid-sensitive dyes
Lee, Cheng-Tsung
Yueh, Wang
Roberts, Jeanette M.
Younkin, Todd R.
Henderson, Clifford L.
ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXV, PTS 1 AND 2, 2008, 6923
[22] Rapid Micro-Patterning of a Conductive PANI/MWNTs-Polymer Composite Using an Optically-induced Electrokinetics Chip
Liu, Na
Liang, Wenfeng
Mai, John D.
Dong, Zaili
Li, Wen J.
Lee, Gwo-Bin
2012 IEEE NANOTECHNOLOGY MATERIALS AND DEVICES CONFERENCE (NMDC), 2013, : 105 - 110

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