Photolithographic patterning of a conductive polymer using a polymeric photoacid generator and a traceless removable group

被引：16
|
作者：
Salavagione, HJ [1 ]
Miras, MC [1 ]
Barbero, C [1 ]
机构：
[1] Univ Nacl Rio Cuarto, Dept Quim, RA-5800 Rio Cuarto, Argentina
来源：
MACROMOLECULAR RAPID COMMUNICATIONS | 2006年 / 27卷 / 01期
关键词：
conducting polymers; lithography; photoacid generator; traceless;
D O I：
10.1002/marc.200500653
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
In the present communication we describe a photolithographic method to produce polyaniline (PANI) patterns using PANI modified with a traceless removable functional group (nitrosated polyaniline, PANI-NO) and external inexpensive polymeric photoacid generators (poly (vinyl chloride), PVC). Therefore, residual sub-products created by irradiation of the plate do not remain occluded in the polymeric films. The borders of the patterns are better defined than in the case of chemical lithography using inorganic acids as the hydrolyzing agent.
引用
收藏
页码：26 / 30
页数：5
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