Charge density dependence of photoinduced stress in semiconductors

被引:3
|
作者
Inui, N [1 ]
机构
[1] Univ Hyogo, Grad Sch Engn, Himeji, Hyogo 6712280, Japan
关键词
semiconductor; photoinduced stress; silicon; bipolar; free carriers;
D O I
10.1143/JJAP.45.1675
中图分类号
O59 [应用物理学];
学科分类号
摘要
An extension of a theory of photoinduced stress ill unipolar semiconductor is considered. To derive a relationship between the magnitude of photoinduced stress and carrier number densities correctly, electrons are clearly distinguished from holes in free carriers. The obtained correction term of photoinduced stress to the existing formula is proportional to electric charge density inside the semiconductor, and its coefficient is determined from the pressure coefficient of the valence band of the semiconductor. Using a corrected formula, numerical calculations of optical deformation for Si, Ge. and GaAs wafers are demonstrated.
引用
收藏
页码:1675 / 1679
页数:5
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