Using FSV with Far-Field Patterns

被引：0

作者：

Johnson, Michael R. ^{[1
]}

Coffey, Edgar L., III ^{[2
]}

机构：

[1] USAF, SEEK EAGLE Off, Eglin AFB, FL 32542 USA

[2] Appl Res Assoc Inc, Belcamp, MD 21017 USA

来源：

2012 IEEE INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY (EMC) | 2012年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Feature Selection Validation has now become an IEEE Standard, and is gaining popularity in the Computational Electromagnetic Community. As with any new approach it presents new and unique challenges to the user. This paper explores the use of Feature Selection Validation for evaluating far-field patterns in several examples and discusses some practical limitation discovered. One important conclusion that must be drawn is that context remains the most important aspect of evaluating results with the Feature Selection Validation process.

引用

页码：686 / 691

页数：6

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