Nucleation behavior in the presence of charge in the CVD diamond process

被引:15
|
作者
Choi, K
Kang, SJL
Jang, HM
Hwang, NM
机构
[1] KOREA RES INST STAND & SCI,TAEJON 305600,SOUTH KOREA
[2] KOREA ADV INST SCI & TECHNOL,YUSUNG GU,TAEJON 305701,SOUTH KOREA
[3] POHANG INST SCI & TECHNOL,POHANG 790600,SOUTH KOREA
关键词
D O I
10.1016/S0022-0248(96)00759-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The CVD diamond process adopts gas activation by plasma or hot filament, which produce abundant charges. In the presence of these charges, the nuclei are expected to be multiply charged. The nucleation behavior in the presence of these charges is studied. The effect of charge is suggested to be twofold: one is the formation of an electrical double layer on the surface of the nuclei cluster and the other is to reduce the nucleation barrier by introducing a Coulomb energy term, which is known as charge-induced nucleation. By the electrical double layer, the surface energy of the dielectric diamond can be reduced more effectively than that of the conducting graphite. This reduction of the surface energy favors the stability of the diamond nuclei over that of the graphite nuclei and can result in the dominant nucleation of diamond over graphite, The reduction of the surface energy and the Coulomb energy term can reduce the nucleation barrier markedly when the nuclei are multiply charged. However, the estimated absolute nucleation rate can barely explain the experimentally observed nucleation rate especially for a gas mixture of low methane concentration.
引用
收藏
页码:416 / 425
页数:10
相关论文
共 50 条
  • [21] Influence of nucleation on hydrogen incorporation in CVD diamond films
    Tang, CJ
    Neves, AJ
    Fernandes, AJS
    [J]. DIAMOND AND RELATED MATERIALS, 2002, 11 (3-6) : 527 - 531
  • [22] Nucleation and early growth of CVD diamond on silicon nitride
    Buchkremer-Hermanns, H
    Ren, H
    Kohlschein, G
    Weiss, H
    [J]. SURFACE & COATINGS TECHNOLOGY, 1998, 98 (1-3): : 1038 - 1046
  • [23] Theoretical analysis of ion bombardment roles in the bias-enhanced nucleation process of CVD diamond
    Wang, BB
    Wang, WL
    Liao, KJ
    [J]. DIAMOND AND RELATED MATERIALS, 2001, 10 (9-10) : 1622 - 1626
  • [24] Effect of bias enhanced nucleation on the nucleation density of diamond in microwave plasma CVD
    Ma, Y
    Tsurumi, T
    Shinoda, N
    Fukunaga, O
    [J]. DIAMOND AND RELATED MATERIALS, 1995, 4 (12) : 1325 - 1330
  • [25] STABILIZATION OF DIAMOND RELATIVE TO DIFFERENT SUBSTRATE CARBON INTERFACES - A NUCLEATION MODEL FOR CVD DIAMOND GROWTH BASED ON A CHARGE-TRANSFER CONSIDERATION
    SANDRE, E
    BONNOT, AM
    CYROTLACKMANN, F
    [J]. DIAMOND AND RELATED MATERIALS, 1994, 3 (4-6) : 448 - 451
  • [26] CVD diamond nucleation enhanced by ultrasonic pretreatment using diamond and mixture of diamond and TaC powders
    Wang, SG
    Zhang, Q
    Yoon, SF
    Ahn, J
    Wang, Q
    Yang, DJ
    Huang, QF
    Rusli
    Tang, WZ
    Lu, FX
    [J]. DIAMOND AND RELATED MATERIALS, 2002, 11 (09) : 1683 - 1689
  • [27] Tribological behavior of CVD diamond films
    [J]. 1600, Electrochemical Soc Inc, Manchester, NH, USA (89):
  • [28] A nanoscaled thermodynamic approach in nucleation of CVD diamond on nondiamond surfaces
    Zhang, CY
    Wang, CX
    Yang, YH
    Wang, GW
    [J]. JOURNAL OF PHYSICAL CHEMISTRY B, 2004, 108 (08): : 2589 - 2593
  • [29] Nucleation studies of pulsed bias enhanced CVD of diamond on biomaterials
    A. N. Jones
    W. Ahmed
    C. A. Rego
    M. J. Jackson
    R. Hall
    [J]. Journal of Materials Engineering and Performance, 2006, 15 : 192 - 194
  • [30] Use of carbonitride film as buffer layer for CVD diamond nucleation
    Karve, P
    Pal, JP
    Patil, SC
    Kulkarni, AA
    Kanetkar, SM
    Parikh, N
    Patnaik, B
    Kshirsagar, ST
    [J]. DIAMOND AND RELATED MATERIALS, 1996, 5 (12) : 1527 - 1531