InGaP/GaAsSb/InGaAsSb double heterojunction bipolar transistors with 703-GHz fmax and 5.4-V breakdown voltage

被引:7
|
作者
Hoshi, Takuya [1 ]
Kashio, Norihide [2 ]
Shiratori, Yuta [1 ]
Kurishima, Kenji [1 ]
Ida, Minoru [1 ]
Matsuzaki, Hideaki [1 ]
机构
[1] NTT Corp, NTT Device Technol Labs, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430198, Japan
[2] NTT Corp, NTT Device Innovat Ctr, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430198, Japan
来源
IEICE ELECTRONICS EXPRESS | 2019年 / 16卷 / 03期
关键词
InP DHBT; InGaP emitter; graded InGaAsSb base; high current gain; maximum oscillation frequency; breakdown voltage; DHBTS;
D O I
10.1587/elex.16.20181125
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This letter presents the current-gain and high-frequency characteristics of double heterojunction bipolar transistors (DHBTs) consisting of an n-InGaP emitter, a p-GaAsSb/p-InGaAsSb base, and an n-InP collector. The impact of the thickness of the first base metal (Pt) on the base contact resistivity is investigated in a p-GaAsSb/p-InGaAsSb test structure for the purpose of improving f(max). A low base contact resistivity (4.8 Omega mu m(2)) is obtained when the Pt layer is thinner than the p-GaAsSb layer. A fabricated InGaP/GaAsSb/InGaAsSb DHBT with a 0.25-mu m emitter exhibits a high current gain of 33 even though the base sheet resistance is as low as 1025 Omega/sq. The DHBT also exhibits an f(max) of 703 GHz and a breakdown voltage of 5.4 V. These results demonstrate that this DHBT technology is useful for fabricating high-speed integrated circuits with high output voltages.
引用
收藏
页数:6
相关论文
共 28 条
  • [21] Abrupt junction InP/GaAsSb/InP double heterojunction bipolar transistors with FT as high as 250 GHz and BVCEO > 6V
    Dvorak, MW
    Pitts, OJ
    Watkins, SP
    Bolognesi, CR
    INTERNATIONAL ELECTRON DEVICES MEETING 2000, TECHNICAL DIGEST, 2000, : 178 - +
  • [22] Improvement of High-Frequency Characteristics of InGaAsSb-Base Double Heterojunction Bipolar Transistors by Inserting a Highly Doped GaAsSb Base Contact Layer
    Kashio, Norihide
    Hoshi, Takuya
    Kurishima, Kenji
    Ida, Minoru
    Matsuzaki, Hideaki
    IEEE ELECTRON DEVICE LETTERS, 2015, 36 (07) : 657 - 659
  • [23] High-speed InGaP/InGaAsN/GaAs NpN double heterojunction bipolar transistors with low turn-on voltage
    Chang, PC
    Monier, C
    Baca, AG
    Li, NY
    Newman, F
    Armour, E
    Hou, HQ
    SOLID-STATE ELECTRONICS, 2002, 46 (04) : 581 - 584
  • [24] 200 GHz fmax, fτ InP/In0.53Ga0.47As/InP metamorphic Double Heterojunction Bipolar Transistors on GaAs substrates
    Kim, YM
    Urteaga, M
    Dahlstrom, M
    Rodwell, MJW
    Gossard, AC
    2003 INTERNATIONAL CONFERENCE INDIUM PHOSPHIDE AND RELATED MATERIALS, CONFERENCE PROCEEDINGS, 2003, : 145 - 148
  • [25] HIGH-SPEED, HIGH BREAKDOWN VOLTAGE INP/INGAAS DOUBLE-HETEROJUNCTION BIPOLAR-TRANSISTORS GROWN BY MOMBE
    CHAU, HF
    BEAM, EA
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1993, 40 (11) : 2121 - 2121
  • [26] 1.5V low-voltage microwave power performance of InAlAs/InGaAs double heterojunction bipolar transistors
    Iwai, T
    Shigematsu, H
    Yamada, H
    Tomioka, T
    Joshin, K
    Fujii, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (02): : 648 - 651
  • [27] Performance enhancement of composition-graded-base type-II InP/GaAsSb double-heterojunction bipolar transistors with fT>500 GHz
    Snodgrass, William
    Wu, Bing-Ruey
    Hafez, Walid
    Cheng, K. Y.
    Feng, Milton
    APPLIED PHYSICS LETTERS, 2006, 88 (22)
  • [28] Molecular beam epitaxy growth and characterization of InGaAlAs-collector heterojunction bipolar transistors with 140 GHz: F-max and 20 V breakdown
    Block, TR
    Wojtowicz, M
    Cowles, J
    Tran, L
    Oki, AK
    Streit, DC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (03): : 2221 - 2224