Optical properties of SiOxNy thin films prepared by ion beam assisted deposition

被引：0
|
作者：
Cho, HJK [1 ]
You, IG [1 ]
Hwangbo, CK [1 ]
机构：
[1] INHA UNIV,DEPT PHYS,INCHON 402751,SOUTH KOREA
来源：
17TH CONGRESS OF THE INTERNATIONAL COMMISSION FOR OPTICS: OPTICS FOR SCIENCE AND NEW TECHNOLOGY, PTS 1 AND 2 | 1996年 / 2778卷
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中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
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页码：209 / 210
页数：2
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