Uniform Coating of High Aspect Ratio Surfaces through Atomic Layer Deposition

Innovative X-ray ray imaging optic technologies, Silicon Pore Optics for example, are often characterised by large length to pore diameter aspect ratios. Such ratios present challenges to the deposition of reflectivity enhancing metallic coatings onto the mirror substrate surfaces. The technique of Atomic Layer Deposition (ALD) is perfectly suited to addressing this challenge due to the inherent self-limiting nature of the process which yields highly uniform coatings with surface roughness compatible with the requirements of high resolution X-ray imaging. We describe the results of a project aimed at developing an optimised ALD reactor and process to coat the internal wall surfaces of high aspect ratio samples with a uniform and smooth metallic layer. For sample substrates of aspect ratio similar to 100 the reactor has realised an average gradient of 1nm in the thickness of an Al2O3 coating on the internal walls of a 76 mm long glass tube.