On the chemistry mechanism for low-pressure chlorine process plasmas

被引:5
|
作者
Levko, Dmitry [1 ]
Raja, Laxminarayan L. [2 ]
机构
[1] Esgee Technol Inc, Austin, TX 78746 USA
[2] Univ Texas Austin, Dept Aerosp Engn & Engn Mech, Austin, TX 78712 USA
来源
关键词
INDUCTIVELY-COUPLED PLASMAS; IONS; DIAGNOSTICS; DISCHARGES; SIMULATION;
D O I
10.1116/6.0002055
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A chemical reaction mechanism of chlorine plasma under low-pressure conditions that is widely used in the literature is validated against the experimental data of Y. Wang and J. K. Olthoff [J. Appl. Phys. 85, 6358 (1999)] for an inductively coupled plasma reactor. The model used in the present study is a self-consistent two-dimensional fluid plasma model coupled with Maxwell's equations. The quantities of interest in the plasma are the fluxes and energy distribution functions of Cl-2(+) and Cl+ ions. We find that the charge exchange reaction between Cl+ and Cl-2 that is typically included in chlorine plasma reaction mechanisms results in poor predictability of the model compared to experiments. Neglecting this reaction allows for a correct prediction of the dominant ion species in the low-pressure chlorine plasma and dependence of their fluxes on the gas pressure. Additionally, neglecting the charge exchange reaction allows for a rather accurate prediction of ion energy distribution functions at the grounded electrode. Overall, we conclude that the rate coefficient of the charge exchange reaction between Cl+ and Cl-2 reported in the literature significantly exceeds what may in fact explain the role of this process in a low-pressure plasma discharge.
引用
收藏
页数:11
相关论文
共 50 条
  • [32] Low-pressure diffusion equilibrium of electronegative complex plasmas
    Ostrikov, K
    Denysenko, IB
    Vladimirov, SV
    Xu, S
    Sugai, H
    Yu, MY
    PHYSICAL REVIEW E, 2003, 67 (05):
  • [33] GIGATRON(R) - A NEW SOURCE FOR LOW-PRESSURE PLASMAS
    PETASCH, W
    RAUCHLE, E
    WEICHART, J
    BICKMANN, H
    SURFACE & COATINGS TECHNOLOGY, 1995, 74-5 (1-3): : 200 - 205
  • [34] TREATMENT OF POLYMER SURFACES BY LOW-PRESSURE MICROWAVE PLASMAS
    MUTEL, B
    DESSAUX, O
    GOUDMAND, P
    GRIMBLOT, J
    CARPENTIER, A
    SZARZYNSKI, S
    REVUE DE PHYSIQUE APPLIQUEE, 1988, 23 (07): : 1253 - 1255
  • [35] Simulation benchmarks for low-pressure plasmas: Capacitive discharges
    Turner, M. M.
    Derzsi, A.
    Donko, Z.
    Eremin, D.
    Kelly, S. J.
    Lafleur, T.
    Mussenbrock, T.
    PHYSICS OF PLASMAS, 2013, 20 (01)
  • [36] Modelling of generation and growth of nanoparticles in low-pressure plasmas
    Gordiets, B. F.
    MULTIFACETS OF DUSTY PLASMA, 2008, 1041 : 23 - 26
  • [37] DISSOCIATION MECHANISM OF CHLOROSILANE TO SILICON IN LOW-PRESSURE MICROWAVE PLASMAS OF ARGON AND ARGON WITH HYDROGEN MIXTURES
    AVNI, R
    CARMI, U
    ROSENTHAL, I
    MANORY, R
    GRILL, A
    THIN SOLID FILMS, 1983, 107 (03) : 235 - 244
  • [38] FUNDAMENTAL PROPERTIES CHARACTERIZING LOW-PRESSURE MICROWAVE-INDUCED PLASMAS AS EXCITATION SOURCES FOR SPECTROANALYTICAL CHEMISTRY
    BUSCH, KW
    VICKERS, TJ
    SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1973, B 28 (03) : 85 - 104
  • [39] Effect of Low-pressure Secondary Treatment in the Development of a Low-pressure Synthesis Process for Biodiesel
    Murakami, Yayoi
    Kuboyama, Hiroki
    Tani, Haruki
    Asami, Kenji
    Fujimoto, Kaoru
    JOURNAL OF THE JAPAN PETROLEUM INSTITUTE, 2025, 68 (02) : 61 - 67
  • [40] A LOW-PRESSURE BPSG DEPOSITION PROCESS
    FOSTER, T
    HOEYE, G
    GOLDMAN, J
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (02) : 505 - 507