Fluorescence Detection of DNA Hybridization Using an Integrated Thin-Film Amorphous Silicon n-i-p Photodiode

被引:0
|
作者
Pimentel, A. C. [1 ]
Cabeca, R. [1 ,2 ]
Rodrigues, M. [1 ,2 ]
Prazeres, D. M. F. [2 ,3 ]
Chu, V. [1 ]
Conde, J. P. [1 ,3 ]
机构
[1] INESC Microsistemas & Nanotecnol, Rua Alves Redol 9, P-1000029 Lisbon, Portugal
[2] IBB, Inst Super Tecn, Ctr Biol Chem Engn, Lisbon 1049, Portugal
[3] Inst Super Tecn, Dept Chem & Biol Engn, Lisbon 1049, Portugal
关键词
D O I
暂无
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This paper presents the fluorescence detection of DNA hybridization with a surface immobilized probe using a hydrogenated amorphous silicon (a-Si:H) photosensor. This sensor integrates a SiO2 layer for DNA probe immobilization, a p-i-n a-Si:H photodiode for fluorescence detection and a fluorescence filter of hydrogenated amorphous silicon carbide (aSiC:H) to cut the excitation light. With this integrated photosensor system, a five order of magnitude difference was obtained in the signal measured at the emission wavelength and that measured at the excitation wavelength for the same incident photon flux. The fluorophore Alexa Fluor 430 was used to label the DNA target molecules and a laser at 405 nm and a photon flux of 5.7x10(16)cm(-2).s(-1) was used as the excitation light source. The detection limit achieved for fluorophores in solution in contact with the device and for fluorophores immobilized on the device surface is 5x10(-9) M and 0.4 pmol/cm(2), respectively. The hybridization of the tagged DNA target with a covalently or electrostatically immobilized probe was successfully detected at a surface density of similar to 3 pmol/cm(2)
引用
收藏
页码:451 / +
页数:2
相关论文
共 50 条
  • [31] Hydrogenated amorphous silicon carbide P-I-N thin-film light emitting diodes with barrier layers inserted at P-I interface
    Jen, Tean-Sen
    Pan, Jen-Wei
    Shin, Nerng-Fu
    Tsay, Wen-Chin
    Hong, Jyh-Wong
    Chang, Chun-Yen
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1994, 33 (1 B): : 827 - 831
  • [32] Boron doped hydrogenated nanocrystalline silicon thin films prepared by layer-by-layer technique and its application in n-i-p flexible amorphous silicon thin film solar cells
    Tao, Ke
    Zhang, Dexian
    Sun, Yun
    Wang, Linshen
    Zhao, Jingfang
    Xue, Ying
    Jiang, Yuanjian
    Cai, Hongkun
    Sui, Yanping
    Wang, Jin
    2009 4TH IEEE INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND MOLECULAR SYSTEMS, VOLS 1 AND 2, 2009, : 327 - +
  • [33] Germanium p-i-n photodiode on silicon for integrated photonic applications
    Mathews, Jay
    Roucka, Radek
    Weng, Change
    Tolle, John
    Menendez, Jose
    Kouvetakis, John
    SILICON PHOTONICS V, 2010, 7606
  • [34] Thin film silicon n-i-p solar cells deposited by VHF PECVD at 100°C substrate temperature
    Brinza, M.
    Rath, J. K.
    Schropp, R. E. I.
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2009, 93 (6-7) : 680 - 683
  • [35] IMMOBILIZATION AND HYBRIDIZATION OF DNA ON AN ALUMINUM(III) ALKANEBISPHOSPHONATE THIN-FILM WITH ELECTROCHEMILUMINESCENT DETECTION
    XU, XH
    BARD, AJ
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 210 : 23 - ANYL
  • [36] Thermal conductivity of amorphous thin-film Al-P-O on silicon
    Wiedle, River A.
    Warner, Mark
    Tate, Janet
    Plassmeyer, Paul N.
    Page, Catherine J.
    THIN SOLID FILMS, 2013, 548 : 225 - 229
  • [37] A boron doped amorphous silicon thin-film bolometer for long wavelength detection
    Heredia, A
    Torres, A
    Jaramillo, A
    De la Hidalga, FJ
    Landa, M
    PROGRESS IN SEMICONDUCTORS II- ELECTRONIC AND OPTOELECTRONIC APPLICATIONS, 2003, 744 : 265 - 270
  • [38] Spectroscopic Ellipsometry Studies of n-i-p Hydrogenated Amorphous Silicon Based Photovoltaic Devices
    Gautam, Laxmi Karki
    Junda, Maxwell M.
    Haneef, Hamna F.
    Collins, Robert W.
    Podraza, Nikolas J.
    MATERIALS, 2016, 9 (03)
  • [39] THIN-FILM SWITCHING DEVICES USING AMORPHOUS-SILICON SILICON CARBON MULTILAYERS
    HATANAKA, Y
    SUZUKI, M
    WATANABE, K
    NAKANISHI, Y
    APPLIED SURFACE SCIENCE, 1993, 65-6 : 532 - 535
  • [40] Variation of back reflector morphology in n-i-p microcrystalline silicon thin film solar cells using texture-etched ZnO
    Boettler, W.
    Smirnov, V.
    Huepkes, J.
    Finger, F.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2012, 358 (17) : 2474 - 2477