Roughness analysis of optical films and substrates by atomic force microscopy

被引：76
|
作者：
Ruppe, C [1 ]
Duparre, A [1 ]
机构：
[1] FRAUNHOFER INST APPL OPT & PRECIS ENGN,D-07745 JENA,GERMANY
来源：
THIN SOLID FILMS | 1996年 / 288卷 / 1-2期
关键词：
atomic force microscopy; light scattering; optical thin films; surface roughness;
D O I：
10.1016/S0040-6090(96)08807-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
From atomic force microscopy (AFM) topographic data, the power spectral densities (PSDs) of substrate and film surfaces were calculated over extended bandwidths. The results were successfully compared with PSDs obtained from angle-resolved scattering (ARS) measurements, while considering the overlapping spectral frequency range of both methods. The PSD curves obtained by AFM also proved to be a suitable tool for investigating the influence of the substrate on the surface topography of thin him coatings. A correlation factor quantifying the relation between the substrate and film PSD is suggested as a measure of substrate replication effects after thin film deposition.
引用
收藏
页码：8 / 13
页数：6
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