Three-Dimensional Integration Technology of Separate SOI Layers for Photodetectors and Signal Processors of CMOS Image Sensors

被引:0
|
作者
Goto, Masahide [1 ]
Hagiwara, Kei [1 ]
Honda, Yuki [1 ]
Nanba, Masakazu [1 ]
Iguchi, Yoshinori [1 ]
Saraya, Takuya [2 ]
Kobayashi, Masaharu [2 ]
Higurashi, Eiji [2 ]
Toshiyoshi, Hiroshi [2 ]
Hiramoto, Toshiro [2 ]
机构
[1] NHK Sci & Technol Res Labs, Setagaya Ku, 1-10-11 Kinuta, Tokyo 1578510, Japan
[2] Univ Tokyo, Tokyo, Japan
关键词
CMOS image sensors; three-dimensional (3-D) integration technology; silicon-on-insulator (SOI);
D O I
暂无
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
We report on three-dimensional (3-D) integration technology of separate silicon-on-insulator (SOI) layers for photodetectors and signal processors of CMOS image sensors. Photodiode, A/D convertor, and counter were integrated in two SOI layers that were vertically connected by embedded Au electrodes, thereby enabling pixel-parallel operation of image sensor. Photodiode has a P+/N/P-structure to suppress the dark current. We developed the image sensor and confirmed its performance of a wide dynamic range of 96 dB and high resolution of 16 bit. The sensor is promising to next-generation ultimate imaging devices.
引用
收藏
页码:70 / 73
页数:4
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