Enhancing device characteristics of 1.3 μm emitting InAs/GaAs quantum dot lasers through dot-height uniformity study

被引:6
|
作者
Liu, Wei-Sheng [1 ]
机构
[1] Yuan Ze Univ, Dept Photon Engn, Chungli, Taiwan
关键词
Quantum dots; Molecular beam epitaxy; Semiconductor lasers; NARROW PHOTOLUMINESCENCE LINEWIDTH; OPTICAL-PROPERTIES; ROOM-TEMPERATURE; INAS; GAAS; DENSITY; SIZE; POWER;
D O I
10.1016/j.jallcom.2013.03.197
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This study systematically improves the dot-height uniformity of InAs/GaAs quantum dot (QD) active layer grown by molecular beam epitaxy system in 1.3 mu m-emitting QD laser diodes. The resulting self-assembled QDs with improved uniformity exhibited an elongated emission wavelength and a reduced linewidth of QD photoluminescence (PL) spectra. The 1.3 mu m-emitting QD lasers with an as-cleaved 5-mu m ridge fabricated under optimal growth conditions exhibited a low threshold current density of 250 A/cm(2) and a high internal quantum efficiency of 63% under continuous-wave operation. The photoluminescent properties and characteristics of the 1.3 mu m-emitting QD lasers was also investigated theoretically using an effective mass model and correlated well with the experimental results, which elucidative clarifying the significant role of dot-height uniformity in achieving high performance QD lasers. (C) 2013 Elsevier B. V. All rights reserved.
引用
收藏
页码:153 / 158
页数:6
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