Modeling the Effect of the Two-Dimensional Hole Gas in a GaN/AlGaN/GaN Heterostructure

被引:0
|
作者
Ghosh, Joydeep [1 ]
Laha, Apurba [1 ]
Saha, Dipankar [1 ]
Ganguly, Swaroop [1 ]
机构
[1] Indian Inst Technol, Dept Elect Engn, Bombay, Maharashtra, India
关键词
GaN/AlGaN/GaN heterostructure; surface donor states; surface barrier height; 2D hole gas; ELECTRON-GAS; ALGAN/GAN;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
GaN/AlGaN/GaN based normally-off high electron mobility transistors (HEMTs) are promising candidates for future high-power as well as high-frequency applications. Here, a physics-based analytical model is presented to explain the effect of a thick GaN cap layer on the two-dimensional electron gas (2DEG) density at the AlGaN/GaN interface, and the surface barrier height in a AlGaN/GaN heterostructure. It has been considered that the surface donor states on the GaN cap top donate electrons to form the 2DEG. Moreover, the impact of a 2D hole gas, formed when the valence band crosses the Fermi energy level, has been scrutinized. This model provides a tool for designing such a GaN/AlGaN/GaN based device over a wide parameter range. The model is shown to match well with available experimental data.
引用
收藏
页码:156 / 159
页数:4
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