Absolute thickness metrology with submicrometer accuracy using a low-coherence distance measuring interferometer

被引:10
|
作者
Zhao, Yang [1 ]
Schmidt, Greg [1 ]
Moore, Duncan T. [1 ]
Ellis, Jonathan D. [1 ,2 ]
机构
[1] Univ Rochester, Inst Opt, Rochester, NY 14627 USA
[2] Univ Rochester, Dept Mech Engn, Rochester, NY 14627 USA
关键词
INDEX; DEFINITION; METER;
D O I
10.1364/AO.54.007693
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Absolute physical thickness across the sample aperture is critical in determining the index of a refraction profile from the optical path length profile for gradient index (GRIN) materials, which have a designed inhomogeneous refractive index. Motivated by this application, instrumentation was established to measure the absolute thickness of samples with nominally plane-parallel surfaces up to 50 mm thick. The current system is capable of measuring absolute thickness with 120 nm (1 sigma) repeatability and submicrometer expanded measurement uncertainty. Beside GRIN materials, this method is also capable of measuring other inhomogeneous and opaque materials. (C) 2015 Optical Society of America
引用
收藏
页码:7693 / 7700
页数:8
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