On the origin of 1.5 μm luminescence in porous silicon coated with sol-gel derived erbium-doped Fe2O3 films

被引:0
|
作者
Gaponenko, NV [1 ]
Mudryi, AV [1 ]
Sergeev, OV [1 ]
Stepikhova, M [1 ]
Palmetshofer, L [1 ]
Jantsch, W [1 ]
Pivin, JC [1 ]
Hamilton, B [1 ]
Baran, AS [1 ]
Rat'ko, AI [1 ]
机构
[1] Belarusian State Univ Informat & Radioelect, Minsk 220027, BELARUS
关键词
porous silicon; erbium; sol-gel; photoluminescence;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Sol-gel derived Fe2O3 films containing about 10 wt% of Er2O3 were deposited on porous silicon by dipping or by a spin-on technique followed by thermal processing at 1073 K for 15 min. The samples were characterized by means of FL, SEM and X-ray diffraction analyses. They exhibit strong room-temperature luminescence at 1.5 mu m related to erbium in the sol-gel derived host. The luminescence intensity increases by a factor of 1000 when the samples are cooled from 300 to 4.2 K. After complete removal of the erbium-doped film by etching and partial etching the porous silicon, the erbium-related luminescence disappears. Following this, luminescence at 1.5 mu m originating from optically active dislocations ("D-lines") in porous silicon was detected. The influence of the conditions of synthesis on luminescence at 1.5 Irm is discussed. (C) 1999 Elsevier Science B.V. All rights reserved.
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收藏
页码:399 / 403
页数:5
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