The Reliability Study and Device Modeling for p-HEMT Microwave Power Transistors

被引:0
|
作者
Liu, S. L. [1 ]
Chang, H. M. [2 ]
Chang, T. [3 ]
Kao, H. L. [2 ]
Cheng, C. H. [1 ]
Chin, A. [1 ]
机构
[1] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu, Taiwan
[2] Chang Gung Univ, Dept Elect Engn, Taoyuan, Taiwan
[3] Chung Shan Inst Sci & Technol, Taoyuan, Taiwan
关键词
AMPLIFIER; SWITCH; MMICS;
D O I
10.1149/1.3629965
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
In this paper, the commercial 0.5-mu m AlGaAs/InGaAs/GaAs pseudo-morphic high electron mobility transistors were subjected to both high-drain voltage and high-temperature stresses for investigating reliability issues. The results reveal that the stress-induced trapping phenomena near two-dimensional electron gas layer should be responsible for the different drain current collapses. The decay level of the DC and the small-signal characteristics increases with the stress voltage and/or the operation temperature. The self-consistent model was established through the de-embedded and the non-linear fitting processes, which can be used to estimate the DC and RF small-signal characteristics degradation under high-drain voltage and high-temperature stress.
引用
收藏
页码:175 / 187
页数:13
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