Deposition of superhard nanolayered TiCrAlSiN thin films by cathodic arc plasma deposition

被引：26

作者：

Kim, Sun Kyu ^{[1
]}

Van Vinh, Pham ^{[2
]}

Lee, Jae Wook ^{[3
]}

机构：

[1] Univ Ulsan, Sch Mat Sci & Engn, Ulsan 680749, South Korea

[2] Hanoi Univ Educ, Dept Solid State Phys & Elect, Hanoi, Vietnam

[3] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea

来源：

SURFACE & COATINGS TECHNOLOGY | 2008年 / 202卷 / 22-23期

关键词：

Superhard nanolayered films; TiCrAlSiN films; Cathodic arc plasma deposition;

D O I：

10.1016/j.surfcoat.2008.06.020

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Thin films of TiCrAlSiN were deposited on SKD 11 toot steel substrate using TiCr and AN cathodes by a cathodic arc plasma deposition system. The influence of nitrogen pressure, AlSi cathode arc current and bias voltage on the mechanical and structural properties of the films were investigated. The hardness of the films increased with the increase of the nitrogen pressure from 0.4 Pa to 4 Pa. A further increase in pressure decreased the film hardness. The hardness of the films increased as the AN cathode arc current was raised from 40 A to 45 A, and then decreased with further increase of the current. The film hardness increased rapidly from 0 V to - 100 V. It then leveled off with a further increase of the bias voltage. The films exhibited a maximum hardness of 43 GPa. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：5395 / 5399

页数：5

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