Emergence of metallic monoclinic states of VO2 films induced by K deposition

被引:6
|
作者
Shiga, D. [1 ,2 ]
Minohara, M. [2 ]
Kitamura, M. [2 ]
Yukawa, R. [2 ]
Horiba, K. [2 ]
Kumigashira, H. [1 ,2 ]
机构
[1] Tohoku Univ, IMRAM, Sendai, Miyagi 9808577, Japan
[2] High Energy Accelerator Res Org KEK, Photon Factory, Inst Mat Struct Sci, 1-1 Oho, Tsukuba, Ibaraki 3050801, Japan
基金
日本学术振兴会; 日本科学技术振兴机构;
关键词
X-RAY-ABSORPTION; INSULATOR-TRANSITION; ELECTRONIC-STRUCTURE; VANADIUM DIOXIDE; POTASSIUM ADSORPTION; MOTT-HUBBARD; IONIC LIQUID; PHASE; SURFACE; SPECTROSCOPY;
D O I
10.1103/PhysRevB.99.125120
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In order to study the origin of metallization of VO2 induced by electron injection, we deposit K atoms onto the surface of VO2 films grown on TiO2 (001) substrates, and we investigate the change in the electronic and crystal structures using in situ photoemission spectroscopy and x-ray absorption spectroscopy (XAS). The deposition of K atoms onto a surface of insulating monoclinic VO2 leads to a phase transition from insulator to metal. In this metallization state, the V-V dimerization characteristic to the monoclinic phase of VO2 still exists, as revealed by the polarization dependence of the XAS spectra. Furthermore, the monoclinic metal undergoes a transition to a monoclinic insulator with decrease in temperature, and to a rutile metal with increase in temperature. These results indicate the existence of a metallic monoclinic phase around the boundary between the insulating monoclinic and metallic rutile phases in the case of electron-doped VO2.
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页数:7
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