Effect of Ni content on CrNiN coatings prepared by RF magnetron sputtering

被引:17
|
作者
Tan, Shuyong [1 ,2 ]
Zhang, Xuhai [3 ]
Zhen, Rui [1 ,2 ]
Tian, Zeng [1 ]
Wang, Zhangzhong [1 ,2 ]
机构
[1] Nanjing Inst Technol, Sch Mat Sci & Engn, Nanjing 211167, Jiangsu, Peoples R China
[2] Jiangsu Key Lab Adv Struct Mat & Applicat Technol, Nanjing 211167, Jiangsu, Peoples R China
[3] Southeast Univ, Sch Mat Sci & Engn, Nanjing 211189, Jiangsu, Peoples R China
基金
中国国家自然科学基金;
关键词
CrNiN coatings; RF magnetron sputtering; Preferred orientation; Microstructure; Hardness; NANOCOMPOSITE COATINGS; PREFERRED ORIENTATION; MECHANICAL-PROPERTIES; TIN/CRN SUPERLATTICE; THIN-FILMS; TI; SUPERHARD; HARDNESS; DEPOSITION; TIN(001);
D O I
10.1016/j.vacuum.2015.06.017
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
CrNiN coatings with various Ni content were deposited by RF reactive magnetron sputtering from Cr-Ni alloy targets. The influence of Ni content on phase structure, preferred orientation, microstructure and hardness of the coatings was investigated. The results show that RF sputtered CrNiN coatings are mainly composed of CrN phase, present columnar growth, and have a nearly feature-less surface morphology. The preferred orientation changes from CrN(220) to CrN(111) as Ni content is increased from 2.92 to 8.79 at.%. The doped Ni can favor dense structure and improve coating surface smoothness, but cannot refine grains. The coating hardness is increased by adding 2.92 at.% Ni due to the effect of discontinuous Ni coverage on hindering grain boundary sliding, dense structure and smoother surface. As Ni content is increased to 8.79 at.%, the hardness is then decreased as a result of too much soft metal and larger grain size. (C) 2015 Elsevier Ltd. All rights reserved.
引用
收藏
页码:54 / 59
页数:6
相关论文
共 50 条
  • [41] Study on SGDC Electrolyte Film Prepared by RF Magnetron Sputtering
    Cong Wang Lihai Xu Weihua Tang Center of Condensed Matter Physics and Material PhysicsSchool of ScienceBeihang UniversityBeijing China Department of PhysicsCenter for Optoelectronics Materials and DevicesZhejiang SciTech UniversityXiasha College ParkHangzhou China
    稀有金属材料与工程, 2006, (S3) : 501 - 503
  • [42] Photoluminescence of nanocrystalline SiC films prepared by rf magnetron sputtering
    Liu, JW
    Xie, FQ
    Zhong, DY
    Wang, EG
    Liu, WX
    Li, SF
    Yang, H
    CHINESE PHYSICS, 2001, 10 : S36 - S39
  • [43] Aluminum nitride layers prepared by DC/RF magnetron sputtering
    Mednikarov, B
    Spasov, G
    Babeva, T
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2005, 7 (03): : 1421 - 1427
  • [44] Structure effect on electrical properties of ITO films prepared by RF reactive magnetron sputtering
    Meng, LJ
    dosSantos, MP
    THIN SOLID FILMS, 1996, 289 (1-2) : 65 - 69
  • [45] Effect of annealing on conductivity behavior of undoped zinc oxide prepared by rf magnetron sputtering
    Xing, G. Z.
    Yao, B.
    Cong, C. X.
    Yang, T.
    Xie, Y. P.
    Li, B. H.
    Shen, D. Z.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2008, 457 (1-2) : 36 - 41
  • [46] Structure effect on electrical properties of ITO films prepared by rf reactive magnetron sputtering
    Meng, LJ
    dosSantos, MP
    THIN FILMS FOR PHOTOVOLTAIC AND RELATED DEVICE APPLICATIONS, 1996, 426 : 431 - 436
  • [47] Effect of ion irradiation on ZnO thin film prepared using RF magnetron sputtering
    Takiguchi, Yosuke
    Toyota, Hiroshi
    Journal of the Vacuum Society of Japan, 2015, 58 (09) : 351 - 355
  • [48] Chopping effect on the crystallinity of ZnO films prepared by a rf planar magnetron sputtering method
    Han, BM
    Chang, S
    Kim, SY
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 1998, 32 (05) : 722 - 726
  • [49] Effect of in Doping on Thermoelectric and Magnetoresistive Properties of ZnO Films Prepared by RF Magnetron sputtering
    Fang, L.
    Ruan, H. B.
    Peng, L. P.
    Yang, X. F.
    Wu, F.
    Kong, C. Y.
    ADVANCED STRUCTURAL AND FUNCTIONAL MATERIALS FOR PROTECTION, 2012, 185 : 37 - +
  • [50] RF MAGNETRON SPUTTERING OF THICK PLATINUM COATINGS ON GLASS MICROSPHERES
    MEYER, SF
    HSIEH, EJ
    BURT, RJ
    THIN SOLID FILMS, 1980, 72 (02) : 373 - 378