Plasma limiter for protecting against high power microwave

被引：0
|
作者：
Yang, Geng [1 ]
Tan, Ji-chun [1 ]
Shem, Ding-yi [1 ]
Yang, Yu-chuan [1 ]
机构：
[1] Natl Univ Def Technol, Coll Sci, Tech Phys Res Inst, Changsha, Hunan, Peoples R China
来源：
JOURNAL OF SCIENTIFIC & INDUSTRIAL RESEARCH | 2008年 / 67卷 / 09期
关键词：
electronic systems; high power microwave; plasma limiter;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Breakdown parameters of plasma limiter are calculated to find new measure to protect electronic systems against high Power microwave (HPM). Limiter filled with Xe of 1 torr can be charged by incident HPM in approximate 14 ns, providing protection to electronic systems.
引用
收藏
页码：685 / 687
页数：3
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