Sputtered lead scandium tantalate thin films: crystallization behaviour during post-deposition annealing

被引:10
|
作者
Huang, Z [1 ]
Donohue, PP
Todd, MA
Jones, JC
Whatmore, RW
机构
[1] Cranfield Univ, Dept Adv Mat, Sch Ind & Mfg Sci, Cranfield MK43 0AL, Beds, England
[2] DERA, Malvern WR14 3PS, Worcs, England
关键词
D O I
10.1088/0022-3727/34/21/304
中图分类号
O59 [应用物理学];
学科分类号
摘要
Lead scandium titanate (PST) thin films were deposited by RF dual magnetron sputtering and then annealed either by vacuum furnace or combined rapid thermal annealing (RTA) and furnace anneal. The film structure was investigated by x-ray diffraction, scanning electron microscopy and transmission electron microscopy (TEM) and energy dispersive x-ray spectroscopy techniques. Lead loss was more severe using furnace annealing than the combined RTA and furnace anneal. The annealed films were characterized by the presence of voids and exhibited relaxor ferroelectric characteristics. PST perovskite crystal grains were found to co-exist with pyrochlore matrix in the furnace-only annealed films, whilst in RTA annealed films no apparent pyrochlore morphology was observed in the TEM image. Lead was found to diffuse through the bottom electrode Pt layer during the annealing. Films treated by combining RTA and furnace annealing have shown pyroelectric coefficients under field of up to 500 muC m(-2) K-1, a dielectric loss of below 0.007 and a merit figure for thermal detection of 2.5 x 10(-5) Pa-1/2.
引用
收藏
页码:3121 / 3129
页数:9
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