Material Nanoprocessing with Nondiffracting Femtosecond Bessel Beams

被引：0

作者：

Courvoisier, F. ^{[1
]}

Bhuyan, M. K. ^{[1
]}

Lacourt, P. -A. ^{[1
]}

Jacquot, M. ^{[1
]}

Furfaro, L. ^{[1
]}

Dudley, J. M. ^{[1
]}

机构：

[1] Univ Franche Comte, FEMTO ST Inst, Dept Opt PM Duffieux, CNRS,UMR 6174, F-25030 Besancon, France

来源：

2010 12TH INTERNATIONAL CONFERENCE ON TRANSPARENT OPTICAL NETWORKS (ICTON) | 2011年

关键词：

nondiffracting Bessel beams; ultrafast laser ablation; filamentation; LASER-PULSES; SURFACE; GLASS;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The use of nondiffracting femtosecond Bessel beams has recently been shown to be a powerful new approach for writing nanometer and micrometer surface features in glass. In this paper we review our recent experimental results in this area. The advantages of Bessel beams in yielding non-critical sample positioning and for fabricating high aspect ratio microchannels will be discussed in detail, and the underlying physical mechanisms involving plasma channel formation and filament formation will also be considered.

引用

页数：4

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