Collective interdiffusion in compositionally modulated multilayers

被引：7
|
作者：
Wang, WH
Bai, HY
Wang, WK
机构：
[1] Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China
[2] Chinese Acad Sci, Cryogen Lab, Beijing 100080, Peoples R China
来源：
JOURNAL OF APPLIED PHYSICS | 1999年 / 86卷 / 08期
关键词：
D O I：
10.1063/1.371355
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Interdiffusion in Fe-Ti, Ag-Bi, Fe-Mo, Ni-Si, Mo-Si, Nb-Si, and Ag-Si multilayers (MLs) was investigated by an in situ low-angle x-ray diffraction technique. Temperature-dependent interdiffusivities were obtained which can be described as Arrhenius relations. The interdiffusion characteristics of the MLs were summarized. The extremely small values of the prefactor D-0 and the marked correlation between the D-0 and activation energy H-e for interdiffusion suggest that a collective atomic jumping mechanism involving 8-15 atoms govern the interdiffusion in the MLs. (C) 1999 American Institute of Physics. [S0021-8979(99)07220-5].
引用
收藏
页码：4262 / 4266
页数：5
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