High-performance three-dimensional on-chip inductors fabricated by novel micromachining technology for RF MMIC

被引：0

作者：

Yoon, JB ^{[1
]}

Han, CH ^{[1
]}

Yoon, E ^{[1
]}

Kim, CK ^{[1
]}

机构：

[1] Korea Adv Inst Sci & Technol, Dept Elect Engn, Yusong Gu, Taejon 305701, South Korea

来源：

1999 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM DIGEST, VOLS 1-4 | 1999年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Using novel micromachining technology, various three-dimensional (3D) on-chip inductors have been fabricated to achieve high performance and small area occupation for GHz applications. We have obtained 14nH, a peak Q of 38 at 1.8GHz with area occupation of 500 mu m by 500 mu m excluding pads (56nH/mm(2)) from a stacked spiral inductor on a glass substrate. Also, 1.75nH and a peak Q of 57 at 10GHz have been obtained from a levitated spiral inductor.

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页码：1523 / 1526

页数：4

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