A high-permeance supported carbon molecular sieve membrane fabricated by plasma-enhanced chemical vapor deposition followed by carbonization for CO2 capture

被引:30
|
作者
Cheng, Li-Hua [1 ,2 ]
Fu, Ywu-Jang [3 ]
Liao, Kuo-Sung [2 ]
Chen, Jung-Tsai [2 ]
Hu, Chien-Chieh [2 ]
Hung, Wei-Song [2 ]
Lee, Kueir-Rarn [2 ]
Lai, Jui-Yih [2 ]
机构
[1] Zhejiang Univ, Dept Environm Engn, Hangzhou 310058, Zhejiang, Peoples R China
[2] Chung Yuan Christian Univ, Dept Chem Engn, R&D Ctr Membrane Technol, Chungli 32023, Taiwan
[3] Vanung Univ, Dept Biotechnol, Chungli 32023, Taiwan
关键词
Supported carbon molecular sieve; membrane; PECVD; Furfuryl alcohol; Flue gas treatment; GAS SEPARATION PROPERTIES; POSITRON-ANNIHILATION SPECTROSCOPY; FURFURYL ALCOHOL; DIOXIDE CAPTURE; AIR SEPARATION; TEMPERATURE; PERFORMANCE; POLYMERIZATION; FORMALDEHYDE; ADSORPTION;
D O I
10.1016/j.memsci.2014.02.033
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
We proposed a novel method of combining plasma enhanced chemical vapor deposition and carbonization to fabricate supported carbon molecular sieve (CMS) membranes. It proved to be more efficient than the traditional technique of repeated cycles of spin coating and carbonization. The effect of carbonization temperature on the membrane physical morphology, chemical structure, and separation performance was investigated. Results showed that the carbonized membranes were defect free, as characterized by both scanning electron microscopy and positron annihilation lifetime spectroscopy, despite the reduced membrane selective layer thickness at high carbonization temperatures. Raman and X-ray photoelectron spectroscopy demonstrated that the CMS membranes carbonized at high temperatures consisted of a graphite like structure. As such, their gas separation performance was enhanced compared with the precursor membrane, particularly the permeance. The supported CMS membrane obtained at a carbonization temperature of 500 degrees C gave the following gas separation performance: CO2 permeance=772.1 GPU. CO2/N-2 selectivity =14.3; O-2 permeance=150.6 GPU, and O-2/N-2 selectivity= 2.8. (C) 2014 Elsevier BM. All rights reserved.
引用
收藏
页码:1 / 8
页数:8
相关论文
共 50 条
  • [21] Co2-laser-assisted plasma-enhanced chemical vapor deposition of silicon dioxide thin film
    Tsai, Hung-Sheng
    Chiu, Hsin-Ching
    Chang, Sheng-Hsiung
    Cheng, Chao-Chia
    Lee, Ching-Ting
    Liu, Hai-Pei
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2001, 40 (5 A): : 3093 - 3095
  • [22] Effects of N2 on the growth of multiwalled carbon nanotubes synthesized by plasma-enhanced chemical vapor deposition
    Yang, JH
    Lee, YJ
    Kim, YH
    Moon, SH
    Ha, BH
    Shin, YS
    Park, SY
    Kim, HS
    Yang, CW
    Yoo, JB
    Park, CY
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (10): : 6713 - 6716
  • [23] CO2-laser-assisted plasma-enhanced chemical vapor deposition of silicon dioxide thin film
    Tsai, HS
    Chiu, HC
    Chang, SH
    Cheng, CC
    Lee, CT
    Liu, HP
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (5A): : 3093 - 3095
  • [24] Deposition and characterization of carbon nitride films from hexamethylenetetramine/N2 by microwave plasma-enhanced chemical vapor deposition
    Uddin, MN
    Fouad, OA
    Yamazato, M
    Nagano, M
    APPLIED SURFACE SCIENCE, 2005, 240 (1-4) : 120 - 130
  • [25] High performance silicon free-standing anodes fabricated by low-pressure and plasma-enhanced chemical vapor deposition onto carbon nanotube electrodes
    Forney, Michael W.
    DiLeo, Roberta A.
    Raisanen, Alan
    Ganter, Matthew J.
    Staub, Jason W.
    Rogers, Reginald E.
    Ridgley, Richard D.
    Landi, Brian J.
    JOURNAL OF POWER SOURCES, 2013, 228 : 270 - 280
  • [26] Nanocrystalline silicon dots fabricated by pulse RF plasma-enhanced chemical vapor deposition of SiCl4-and-H2 mixture
    Shirai, H
    Seri, Y
    Jia, H
    Kurosaki, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2003, 42 (10A): : L1191 - L1194
  • [27] Luminescent silicon nanocrystal dots fabricated by SiCl4/H2 RF plasma-enhanced chemical vapor deposition
    Shirai, H
    Tsukamoto, T
    Kurosaki, K
    PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2003, 16 (3-4): : 388 - 394
  • [28] Growth of high-quality carbon nanotubes by grid-inserted plasma-enhanced chemical vapor deposition for field emitters
    Kojima, Y
    Kishimoto, S
    Ohno, Y
    Sakai, A
    Mizutani, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (4B): : 2600 - 2603
  • [29] Effect of CO2 Laser on SiNx Films Fabricated by Low-Temperature Laser-Assisted Plasma Enhanced Chemical Vapor Deposition
    Choi, Jung A.
    Lee, Ho-Nyun
    Cho, Kwan Hyun
    Lee, Seung-Woo
    Ju, Byeong-Kwon
    Kang, Kyung Tae
    NANOSCIENCE AND NANOTECHNOLOGY LETTERS, 2016, 8 (07) : 549 - 554
  • [30] A carbon molecular sieve membrane-based reactive separation process for pre-combustion CO2 capture
    Cao, Mingyuan
    Zhao, Linghao
    Xu, Dongwan
    Ciora, Richard
    Liu, Paul K. T.
    Manousiouthakis, Vasilios, I
    Tsotsis, Theodore T.
    JOURNAL OF MEMBRANE SCIENCE, 2020, 605