In-Situ Fabrication of {111} Mirror and Optical Bench using Double-Sided Anisotropic Wet Etching of {100} Silicon Wafer

被引：0

作者：

Kim, Jung-Mu ^{[1
]}

Kim, Hyunseok ^{[3
]}

Yoo, Sunghyun ^{[3
]}

Lee, Kook-Nyung ^{[2
]}

Kim, Yong-Kweon ^{[3
]}

机构：

[1] Chonbuk Natl Univ, Dept Elect Engn, Jeonju, South Korea

[2] KETI, Seongnam, South Korea

[3] Seoul Natl Univ, Dept Elect Engn & Comp Sci, Seoul 151, South Korea

来源：

2012 INTERNATIONAL CONFERENCE ON OPTICAL MEMS AND NANOPHOTONICS (OMN) | 2012年

关键词：

{111} mirror; optical bench; double-sided anisotropic wet etching; < 100 > oriented silicon;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This work presents a novel fabrication method for {111} dual mirror and optical bench using double-sided anisotropic wet etching of < 100 > oriented silicon wafer. The roughness of the wet etched {111} plane is 8 nm.

引用

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页码：125 / +

页数：2

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