The modern concept of focused ion beam techniques to reliability analysis for VLSI manufacturing

被引：0
|
作者：
Ulieru, D [1 ]
机构：
[1] ROMES SA,CORP MGMT,BUCHAREST 72996,ROMANIA
来源：
MICROELECTRONIC MANUFACTURING YIELD, RELIABILITY, AND FAILURE ANALYSIS II | 1996年 / 2874卷
关键词：
focused ion beam; failure analysis; microscopic cross sectioning; SIM; SEN images; electromigration; micro-slicing; grain size; microstructure analysis; aluminium missing; metallization process;
D O I：
10.1117/12.250847
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：352 / 359
页数：8
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