Resonant metamaterials for contrast enhancement in optical lithography

被引：2
|
作者：
Dobmann, Sabine [1 ,2 ,3 ,4 ]
Shyroki, Dzmitry [2 ]
Banzer, Peter [1 ,2 ,4 ]
Erdmann, Andreas [5 ]
Peschel, Ulf [2 ,4 ]
机构：
[1] Max Planck Inst Sci Light, Erlangen, Germany
[2] Univ Erlangen Nurnberg, Inst Opt Informat & Photon, D-91054 Erlangen, Germany
[3] SAOT, Grad Sch Adv Opt Technol, Erlangen, Germany
[4] Cluster Excellence Engn Adv Mat, Erlangen, Germany
[5] Fraunhofer Inst Integrated Syst, Erlangen, Germany
来源：
OPTICS EXPRESS | 2012年 / 20卷 / 18期
关键词：
HOLE ARRAYS; TRANSMISSION; LIGHT;
D O I：
10.1364/OE.20.019928
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The transmission through ultra-thin metal films is noticeable and thus limits their potential for the formation of lithographic masks. By sub-wavelength patterning of a metal film with a post structure, a resonant metamaterial is formed, which can effectively suppress the transmission. Measurements as well as calculations identify the width of the metal islands as a critical geometrical feature. Hence, the extraordinarily low transmission effect can be explained by the resonant response of single scatterers known as Localized Surface Plasmon Resonances (LSPR). A potential application of this suppressed transmission effect to thin metal masks in optical lithography is experimentally investigated. (C) 2012 Optical Society of America
引用
收藏
页码：19928 / 19935
页数：8
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