Resonant metamaterials for contrast enhancement in optical lithography

被引：2

作者：

Dobmann, Sabine ^{[1
,2
,3
,4
]}

Shyroki, Dzmitry ^{[2
]}

Banzer, Peter ^{[1
,2
,4
]}

Erdmann, Andreas ^{[5
]}

Peschel, Ulf ^{[2
,4
]}

机构：

[1] Max Planck Inst Sci Light, Erlangen, Germany

[2] Univ Erlangen Nurnberg, Inst Opt Informat & Photon, D-91054 Erlangen, Germany

[3] SAOT, Grad Sch Adv Opt Technol, Erlangen, Germany

[4] Cluster Excellence Engn Adv Mat, Erlangen, Germany

[5] Fraunhofer Inst Integrated Syst, Erlangen, Germany

来源：

OPTICS EXPRESS | 2012年 / 20卷 / 18期

关键词：

HOLE ARRAYS; TRANSMISSION; LIGHT;

D O I：

10.1364/OE.20.019928

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The transmission through ultra-thin metal films is noticeable and thus limits their potential for the formation of lithographic masks. By sub-wavelength patterning of a metal film with a post structure, a resonant metamaterial is formed, which can effectively suppress the transmission. Measurements as well as calculations identify the width of the metal islands as a critical geometrical feature. Hence, the extraordinarily low transmission effect can be explained by the resonant response of single scatterers known as Localized Surface Plasmon Resonances (LSPR). A potential application of this suppressed transmission effect to thin metal masks in optical lithography is experimentally investigated. (C) 2012 Optical Society of America

引用

页码：19928 / 19935

页数：8

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