Development of a MEMS/IC Design Environment for RFIC applications

被引：1
|
作者：
Xin, Sun [1 ]
Fu Zhengzhong [1 ]
Cheng, Yuhua [1 ]
机构：
[1] Peking Univ, Shanghai Res Inst Microelect SHRIME, Shanghai, Peoples R China
来源：
CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE 2010 (CSTIC 2010) | 2010年 / 27卷 / 01期
关键词：
D O I：
10.1149/1.3360615
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
The development of MEMS/IC design environment based on SMIC 0.13um CMOS process was reported. This effort includes the development of PDK (Process Design Kit) by integrating MEMS inductor devices. The MEMS inductors can be used to design high performance RF circuit with standard CMOS devices. A low noise amplifier (LNA) circuit was designed with the PDK. The results showed that the MEMS inductors can improve the performance of the LNA circuit and the PDK can be used for Radio Frequency Integrated Circuits (RFIC) design. This work has laid a foundation for our future development of a design environment for MEMS/IC applications.
引用
收藏
页码：173 / 178
页数：6
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