Atomic Layer Deposition of Cobalt, Nickel, and Iron Sulfides: Synthesis and Applications

被引：4
|
作者：
Wang, Xinwei [1 ]
机构：
[1] Peking Univ, Sch Adv Mat, Shenzhen Grad Sch, Shenzhen 518055, Peoples R China
来源：
ATOMIC LAYER DEPOSITION APPLICATIONS 13 | 2017年 / 80卷 / 03期
基金：
中国国家自然科学基金;
关键词：
D O I：
10.1149/08003.0077ecst
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Recent development on the atomic layer deposition (ALD) of CoSx, NiSx, and FeSx is presented. The sulfides are deposited by using metal amidinates as the metal precursors and H2S as the sulfur source. Ideal saturated, self-limiting growth behaviors are observed for all these ALD processes, and the deposited sulfide films are able to uniformly and conformally cover deep narrow trenches with high aspect ratio of 10:1. Examples of using these ALD processes to synthesize CoSx, NiSx, and FeSx thin films for the respective applications in supercapacitors, electrocatalysis, and chemical catalysis are also presented.
引用
收藏
页码：77 / 85
页数：9
相关论文
共 50 条
  • [41] Tuning the Electronic Structure of Tin Sulfides Grown by Atomic Layer Deposition
    Ham, Giyul
    Shin, Seokyoon
    Park, Joohyun
    Choi, Hagyoung
    Kim, Jinseo
    Lee, Young-Ahn
    Seo, Hyungtak
    Jeon, Hyeongtag
    ACS APPLIED MATERIALS & INTERFACES, 2013, 5 (18) : 8889 - 8896
  • [42] Nickel Germanide Thin Films by Atomic Layer Deposition
    Vayrynen, Katja
    Vihervaara, Anton
    Hatanpaa, Timo
    Mattinen, Miika
    Heikkila, Mikko J.
    Mizohata, Kenichiro
    Raisanen, Jyrki
    Ritala, Mikko
    Leskela, Markku
    CHEMISTRY OF MATERIALS, 2019, 31 (14) : 5314 - 5319
  • [43] Synthesis and Characterization of Nanocoatings Thin films by Atomic Layer Deposition for Medical Applications
    Wadullah, Haitham M.
    Ajeel, Sami Abualnoun
    Abbass, Muna Khethier
    2ND INTERNATIONAL CONFERENCE ON SUSTAINABLE ENGINEERING TECHNIQUES (ICSET 2019), 2019, 518
  • [44] Applications of atomic layer deposition in solar cells
    Niu, Wenbin
    Li, Xianglin
    Karuturi, Siva Krishna
    Fam, Derrick Wenhui
    Fan, Hongjin
    Shrestha, Santosh
    Wong, Lydia Helena
    Tok, Alfred ling Yoong
    NANOTECHNOLOGY, 2015, 26 (06)
  • [45] Atomic layer deposition for nonconventional nanomaterials and their applications
    Nam, Taewook
    Kim, Hyungjun
    JOURNAL OF MATERIALS RESEARCH, 2020, 35 (07) : 656 - 680
  • [46] Atomic layer deposition: medical and biological applications
    Skoog, S. A.
    Elam, J. W.
    Narayan, R. J.
    INTERNATIONAL MATERIALS REVIEWS, 2013, 58 (02) : 113 - 129
  • [47] Leading Edge Atomic Layer Deposition Applications
    Sundaram, G. M.
    Monsma, D. J.
    Becker, J. S.
    ATOMIC LAYER DEPOSITION APPLICATIONS 4, 2008, 16 (04): : 19 - 27
  • [48] Atomic layer deposition for nonconventional nanomaterials and their applications
    Taewook Nam
    Hyungjun Kim
    Journal of Materials Research, 2020, 35 : 656 - 680
  • [49] Atomic Layer Deposition for Nanoscale Contact Applications
    Kim, Hyungjun
    Yoon, Jaehong
    Lee, Han-Bo-Ram
    2011 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE AND MATERIALS FOR ADVANCED METALLIZATION (IITC/MAM), 2011,
  • [50] Atomic Layer Deposition for Energy and Environmental Applications
    Dasgupta, Neil P.
    Li, Liang
    Sun, Xueliang
    ADVANCED MATERIALS INTERFACES, 2016, 3 (21):
12345