Dynamic ultrafast laser spatial tailoring for parallel micromachining of photonic devices in transparent materials

被引:67
|
作者
Mauclair, C. [1 ,2 ]
Cheng, G. [1 ]
Huot, N. [1 ]
Audouard, E. [1 ]
Rosenfeld, A. [2 ]
Hertel, I. V. [2 ,3 ]
Stoian, R. [1 ]
机构
[1] Univ St Etienne, Lab Hubert Curien, UMR 5516, CNRS, F-42000 St Etienne, France
[2] Max Born Inst Nichtlineare Opt & Kurzzeitspektros, D-12489 Berlin, Germany
[3] Free Univ Berlin, Fachbereich Phys, D-14195 Berlin, Germany
来源
OPTICS EXPRESS | 2009年 / 17卷 / 05期
关键词
WAVE-GUIDES; FUSED-SILICA; WRITTEN; GLASS;
D O I
10.1364/OE.17.003531
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Femtosecond laser processing of bulk transparent materials can generate localized positive changes of the refractive index. Thus, by translation of the laser spot, light-guiding structures are achievable in three dimensions. Increasing the number of laser processing spots can consequently reduce the machining effort. In this paper, we report on a procedure of dynamic ultrafast laser beam spatial tailoring for parallel photoinscription of photonic functions. Multispot operation is achieved by spatially modulating the wavefront of the beam with a time-evolutive periodical binary phase mask. The parallel longitudinal writing of multiple waveguides is demonstrated in fused silica. Using this technique, light dividers in three dimensions and wavelength-division demultiplexing (WDD) devices relying on evanescent wave coupling are demonstrated. (C) 2009 Optical Society of America
引用
收藏
页码:3531 / 3542
页数:12
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