Formation of SnAg solder bump by multilayer electroplating

被引:8
|
作者
Zhao, Qinghua [1 ]
Chen, Zhuo [1 ]
Hu, Anmin [1 ]
Li, Ming [1 ]
机构
[1] Shanghai Jiao Tong Univ, State Key Lab Met Matrix Composites, Sch Mat Sci & Engn, Shanghai 200240, Peoples R China
基金
中国国家自然科学基金;
关键词
Electroplating; Bump formation; SnAg alloy; Interfacial reaction; MECHANICAL-PROPERTIES; SHEAR-STRENGTH; JOINTS; ELECTRODEPOSITION; RELIABILITY; INDIUM;
D O I
10.1016/j.mee.2013.01.055
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A novel method, multilayer electroplating, was proposed to prepare alloy bumps. It consists to electroplating different structural elements of alloys sequentially and then forming uniform alloy through reflowing. The formation of eutectic SnAg alloy bumps was taken as an example to verify the applicability of the method in this study. Near-eutectic SnAg solder bumps were formed successfully through multilayer electroplating. After reflowing for 1 min at 250 degrees C, SnAg alloy with homogeneous structure and composition was obtained from multilayer structure. Fine Ag3Sn particles with uniform distribution were precipitated inside the solder and Cu6Sn5 intermetallic compounds (IMCs) in scallop-like shape formed at the SnAg solder/Cu interface. As reflow time increasing, the morphology of Ag3Sn remained unchanged but the thickness of Cu6Sn5 layer increased. The characteristic of multilayer electroplated SnAg solder bumps was similar to that of traditional alloy, which indicated that it was a suitable method to form SnAg alloy solder bumps. (c) 2013 Elsevier B.V. All rights reserved.
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页码:33 / 37
页数:5
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