Study on the lateral growth of the diamond in the substrate holder and the effect of temperature gradient on the large-area diamond surface morphology

被引:4
|
作者
Yang, Bo [1 ]
Zhang, Rongjun [2 ]
Shen, Qiao [2 ]
Zhang, Libin [1 ]
Gan, Zhiyin [1 ,2 ]
Liu, Sheng [1 ,3 ,4 ]
机构
[1] Huazhong Univ Sci & Technol, Sch Mech Sci & Engn, Wuhan 430074, Peoples R China
[2] TrueOne Semicond Technol Co Ltd, Dongguan 528251, Guangdong, Peoples R China
[3] Wuhan Univ, Sch Power & Mech Engn, Key Lab Transients Hydrol Machinery, Minist Educ, Wuhan 430072, Peoples R China
[4] Wuhan Univ, Inst Technol Sci, Res Ctr Elect Mfg & Packaging Integrat, Wuhan 430072, Peoples R China
基金
中国国家自然科学基金;
关键词
SINGLE-CRYSTAL DIAMOND; HOMOEPITAXIAL GROWTH; EDGE QUALITY;
D O I
10.1007/s10853-020-05256-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The study of the distance between the substrate edge and the substrate holder cavity edge on the growth quality was further carried out. The results showed that the substrate edge quality decreased with the increase in the distance from the substrate edge to the substrate holder cavity edge, and the lateral growth rate significantly increased. Therefore, a three-step growth method was proposed. After 68 h of growth, the substrate size grew from 3.57 mm x 3.63 mm x 1.01 mm to 6.13 mm x 6.04 mm x 2.52 mm, but at the end of the third step, the quality and the morphology of the substrate became poor. Two experiments were carried out to verify the influence of eccentric placement and the substrate holder cavity edge on the substrate morphology. The results showed that the influence of the substrate holder cavity edge on the substrate edge quality was more significant than that of eccentric placement. Because of the lateral growth, the substrate edge will inevitably be closer to the cavity edge during the growth, and its temperature gradient will increase. Therefore, an improved substrate holder was designed, and the simulation results showed that the new substrate holder could effectively guarantee the uniformity of the temperature gradient on the large-scale substrate surface.
引用
收藏
页码:17072 / 17080
页数:9
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