Electrochemical Synthesis and Characterization of Ni-P Alloy Coatings from Eutectic-Based Ionic Liquid

被引:51
|
作者
You, Yihui
Gu, Changdong [1 ]
Wang, Xiuli
Tu, Jiangping
机构
[1] Zhejiang Univ, Key Lab Adv Mat & Applicat Batteries Zhejiang Pro, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
基金
中国国家自然科学基金; 高等学校博士学科点专项科研基金;
关键词
HYDROGEN EVOLUTION REACTION; ELECTROCATALYTIC OXIDATION; CORROSION-RESISTANCE; COMPOSITE COATINGS; CHOLINE CHLORIDE; AMORPHOUS ALLOY; ELECTRODEPOSITION; BEHAVIOR; NUCLEATION; DEPOSITION;
D O I
10.1149/2.012211jes
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Ni-P alloy coatings with tunable phosphorus contents are electrodeposited at room temperature using choline chloride: ethylene glycol (1: 2 molar ratio) deep eutectic solvent and NiCl2 center dot 6H(2)O, NaH2PO2 center dot H2O as nickel and respectively phosphorous sources. Cyclic voltammetry shows that the presentence of H2PO2- in the ionic liquid based Ni plating bath promotes the initiation of Ni-P nucleation. Chronoamperometric results indicate that the electrodeposition of Ni and Ni-P alloys on a platinum electrode follows the mechanism of instantaneous nucleation and three-dimensional growth with diffusion-controlled. Surface morphology and chemical composition of the alloy coatings are significantly dependent on the molar ratio of H2PO2-/Ni2+ in the electrolyte. Moreover, deposition potential and time have a remarkable effect on the surface morphology of deposits. X-ray diffractometer analysis indicates that the structure of alloys converts from crystalline to amorphous structure as the phosphorus content in the coating increases. Potentiodynamic polarization measurements show that the alloy coating exhibits the nobler corrosion potential and the lower corrosion current density compared with the Ni coating. The more phosphorus content the Ni-P coating has, the more positive corrosion potential and the lower corrosion current density the coating exhibits. (C) 2012 The Electrochemical Society. [DOI: 10.1149/2.012211jes] All rights reserved.
引用
收藏
页码:D642 / D648
页数:7
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